
High Performance Materials

fpour@flodynamix.com Dr. Mo Toofan -Technical Advisor mtoof@flodynamix.com

A state of matter in which the molecules are free to move in any direction and expand to fill a container in which they are held.
Microscopic liquid particles suspended in gas.
Airborne Particulates:
Microscopic pieces of solid suspended in air.


After Sample Taking
Before Sample Taking


Before Sample Taking After Sample Taking




Table 1: Anions Sampling (without use of concentrator)
| Analyte | DL (ng/L air) |
| Cl - | 0.2 |
| F - | 3.0 |
| NOX - | 1 |
| POX 3 | 3 |
| SOX | 2 |
| RCOO - | 3 |

Table 2: Cations Sampling for IC and ICP/MS analysis
| Analyte | DL (ng/L air) |
| Na + | 1 |
| K + | 1 |
| Ca 2+ | 2 |
| NH4 + | 1 |
| Ni 2+ | 2 |
| Cr 3+ | 2 |

a-Chemical Sources b-Consumable c-DI-Water
2.Indirect: a-Physical Sources b-Chemical Sources




SO2 (Gas Phase) SO2 (Dissolved in H2O) Slow Step SO2 (Dissolved in H2O) + H2O H2SO3 2H2O2 2H2O + O2
1 Fast Step
H2SO3 + 2 O2 H2SO4


| SO2 Flow Rate (mL/Min) | N2 Gas as a Dilution Gas (mL/Min) | Average Peak area (10 –5 ) |
|---|---|---|
| 84 | 0 | 172 + 3.4* |
| 84 | 1,000 | 169 + 3.2 * |
| 84 | 1,500 | 167 + 3.3 * |
| 84 | 2,000 | 160 + 3.0 * |
* 35 injections/ run

Sulfate peak Area ( X 10 -5)
2000 1500 1000

Sulfur Dioxide Flow rate (mL/min)

| SO2 Flow Rate [ mL/min ] | Sulfate Peak Area ( X 10 5 ) [ 0 mL/min N2 gas ] | Sulfate Peak Area ( X 10 5 ) [ 1000 mL/min N2 gas ] |
|---|---|---|
| 0 | 0 | 0 |
| 92 | 254 | 250 |
| 165 | 430 | 425 |
| 341 | 869 | 900 |
| 510 | 1365 | 1360 |
| 683 | 1950 | 1965 |


| SO2, Flow Rate (mL/min) | Recovery (%) |
|---|---|
| 80 | 99 |
| 163 | 97 |
| 305 | 99 |
| 445 | 98 |
| 680 | 97 |
| 778 | 99 |
| 890 | 98 |
[SO2] = 9.9 nL/L

| Hydrogen Peroxide (mM) | Sulfate Peak Area ( X 10 5 ) |
|---|---|
| 0.00 | 250 |
| 0.27 | 435 |
| 0.54 | 450 |
| 0.80 | 450 |
| 1.10 | 449 |
| 1.42 | 450 |
| 1.76 | 452 |
| 2.85 | 450 |


0.00
1.00 2.00 3.00 4.00 Hydrogen Peroxide Concentration (mM)
Recovery of Sulfur Dioxide By Air Sampler in 0.54 mM Hydrogen Peroxide
9999 99 98 98
97 97
0 200 400 600 800 1000 SO2 Flow Rate (mL/min)
1155 Park Avenue, Emeryville, CA 94608 • (888) 99 NuGen • (707) 820 4080 Fax (707) 820 4079 www.nugentec.com info@nugentec.com
% Recovery (SulfateIon)

| NH3Flow Rate | |
|---|---|
| [ mL/min ] | % Recovery |
| 36 | 99 |
| 136 | 98 |
| 200 | 96 |
| 442 | 98 |
| 650 | 97 |
| 820 | 99 |
| 968 | 99 |
Concentration of NH3 = 11nL/L


SO3 Isopropyl Alcohol SO2 Hydrogen Peroxide HCl Diluted sodium Hydroxide NH3 Diluted Hydrochloric acid NO2 Triethanolamine

| PK # | RT | Detected Compounds | PPB | Possibility |
|---|---|---|---|---|
| 1 | 3.79 | 2-Propenoic Acid, 2-Methyle | 0.27 | P |
| 2 | 6.26 | 2H-Azepin-2-one, Hexahedron | 0.12 | A |
| 3 | 6.46 | 1-Amino-2, 2-dimethyle-norbornane | 0.88 | A |
| 4 | 7.06 | Benzene, 2, 3-Di-Isocyaanato-1-methyl | 0.38 | H |
| 5 | 7.25 | 1, 5-Heptadiene, 2-Methyl | 0.99 | H |
| 6 | 7.31 | 2-Propanamine, 2-Metthyl | 0.12 | A |
| 7 | 9.9 | Furan, 2, 5-Diethyltetrahydro | 0.73 | H |
| 8 | 11.19 | 2-Propanic Acid, 2-Methyl | 0.22 | P |
| 9 | 11.83 | Poperidine, 1-Nitroso | 1.1 | A |
| 10 | 12.93 | 2-Proponic Acid, 2-Methyl-1,2 Ethyl | 0.19 | P |
| 11 | 14.49 | 2-Proponic Acid, 2-Methyl, 1, 2 Ethane | 0.15 | P |
| 12 | 16.03 | Proponic Acid, 2-Hydroxy-2-Methyl | 0.1 | P |
| Total Items | PPB | Total % |
|---|---|---|
| Plasticizer | 0.93 | 17.70 |
| Adhesive | 2.22 | 42.30 |
| Hydrocarbons | 2.1 | 40.00 |
4079


| 1. Hard Disk Manufacturing No.1 (Class 100 Clean room) | Suspected NO2 gas contamination was causing low yield |
| 2. Hard Disk Manufacturing No. 2 (Class 100 Clean room) | Random periods of low yield |
| 3. Semiconductor Manufacturing No.1 (Class 10 and 100 Clean rooms) | Low yields, plans for higher resolution chips |
| 4. Semiconductor Manufacturing No. 2 (Class 10 and 100 Clean rooms) | High resolution chips. General interest in preventive measures to ensure good yield |

PEAK AREA (X10-5)

WEEKS

| Location | Low Ammonia Conc. (nL/L) | High Ammonia Conc. (nL/L) | Avg. Ammonia Conc. (nL/L) |
|---|---|---|---|
| Load | 14.0 | 40.0 | 29.0 |
| Texture | 8.1 | 9.0 | 9.0 |
| Wash # 1 | 148.0 | 212.0 | 183.0 |
| Sputtering | 0.6 | 0.7 | 0.6 |
| Wash # 2 | 5.1 | 5.5 | 5.5 |
| QC | 3.4 | 3.8 | 3.8 |

| Location | Sodium (ng/L) | Ammonia (ng/L) | Potassium (ng/L | Chloride (ng/L) |
|---|---|---|---|---|
| Plating | <0.2 | 1.0 | <0.03 | <1.0 |
| Sputtering | 11.0 | 0.7 | 0.5 | 3.0 |
| Photoresist | 6.6 | 1.0 | 0.3 | 2.8 |
| Plasma Etch | 1.5 | 2.1 | <0.03 | 0.7 |

| Analyte (nL/L) | Class 100 production Clean room | Ammonia (ng/L) | Potassium (ng/L | Chloride (ng/L) |
|---|---|---|---|---|
| Fluoride as HF | H 0.5 L 0.2 Avg. 3.5 | 1.0 | <0.03 | <1.0 |
| Formic Acid | H 3.2 L 1.1 Avg. 1.4 | 0.7 | 0.5 | 3.0 |
| NO2 | H 3.3 L 1.3 Avg. 1.8 | 1.0 | 0.3 | 2.8 |
| Ammonia | H 23 L 1.3 Avg. 1.8 | 2.1 | <0.03 | 0.7 |


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