Ni/P Media

Surfactants, cleaners, etchants, acids and alkalis.  High purity, ultra-filtered (0.2 um).

NuWet PG 3:  Acid Based disk substrate cleaner
NuRinse S 3:  Neutral pH, disk Substrate cleaner.

NuLap TA:  Disk polishing slurry solution. Aluminum oxide Polishing steps.

NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications.  Also for texture "buff" cleaning using tape media.
NuKlean WX 25A:  Acidic Post Polish Ultrasonic Immersion tank cleaner.

NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner.  For Very Aggressive Cleaning.
NuWet DM Series:  Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.

NuLap BQ Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps.
NuLap MC Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps.

NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications.  Also for texture "buff" cleaning using tape media.

NuRinse BR, NuKlean WA 12:  Buff Tape Cleaning
NuKlean WX 25A

NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner.  For Very Aggressive Cleaning.
NuWet DM Series:  Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.

NuRinse S 3: Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.

NuWet 133:  Non-ionic blended surfactant cleaner containing no builders, chelates, EDTA, acids, or caustics or amines.
NuRinse S3:  Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.